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- W2163040657 abstract "Double Patterning Lithography (DPL) is currently being used as part of Resolution Enhancement Technique (RET) in 45nm and 32nm technologies. DPL involves partitioning a layout into two masks to reduce interference from neighboring patterns and improve resolution. Triple pattern lithography has also been suggested as a way to continue scaling with trailing lithography technology. However, due to complexity involved with dense layouts, sometimes a polygon in a layout needs to be split into two masks, placing additional demand on precision of overlay control. These are known as stitches that may adversely impact manufacturing yield. Most of the previous layout decompositions for DPL are primarily based on using geometric rules such as minimum distance criteria. Such approaches neglect the positive effects that polygons in a mask may have on one another and may introduce unnecessary stitches. In this paper, we propose a model based layout decomposition technique that uses simulated annealing (SA) for mask assignment. The model based approach uses a fast lithography simulator to compute Edge Placement Error (EPE) which is then used as a metric for mask assignment. SA based mask assignment allows a greater solution space to be explored. We present results comparing SA based approach against greedy solution. It is shown that SA based approach converges to better quality solutions with nearly 20X reduction in runtime on average. The study reports the number of moves, stitches, EPE and runtime to illustrate the qualitative improvements offered by this solution." @default.
- W2163040657 created "2016-06-24" @default.
- W2163040657 creator A5008440756 @default.
- W2163040657 creator A5054064879 @default.
- W2163040657 date "2011-03-01" @default.
- W2163040657 modified "2023-09-27" @default.
- W2163040657 title "Model based double patterning lithography (DPL) and simulated annealing (SA)" @default.
- W2163040657 cites W1977289802 @default.
- W2163040657 cites W1985878162 @default.
- W2163040657 cites W1989089234 @default.
- W2163040657 cites W2009102457 @default.
- W2163040657 cites W2018868256 @default.
- W2163040657 cites W2021311077 @default.
- W2163040657 cites W2032431794 @default.
- W2163040657 cites W2044880283 @default.
- W2163040657 cites W2059147047 @default.
- W2163040657 cites W2059229417 @default.
- W2163040657 cites W2094370252 @default.
- W2163040657 cites W2097032051 @default.
- W2163040657 cites W2103803680 @default.
- W2163040657 cites W2114153270 @default.
- W2163040657 cites W2115795789 @default.
- W2163040657 cites W2122865323 @default.
- W2163040657 cites W2135419229 @default.
- W2163040657 cites W2146192871 @default.
- W2163040657 cites W2156916628 @default.
- W2163040657 cites W2164380619 @default.
- W2163040657 cites W2914275007 @default.
- W2163040657 cites W3149318025 @default.
- W2163040657 doi "https://doi.org/10.1109/isqed.2011.5770754" @default.
- W2163040657 hasPublicationYear "2011" @default.
- W2163040657 type Work @default.
- W2163040657 sameAs 2163040657 @default.
- W2163040657 citedByCount "1" @default.
- W2163040657 countsByYear W21630406572015 @default.
- W2163040657 crossrefType "proceedings-article" @default.
- W2163040657 hasAuthorship W2163040657A5008440756 @default.
- W2163040657 hasAuthorship W2163040657A5054064879 @default.
- W2163040657 hasConcept C113775141 @default.
- W2163040657 hasConcept C11413529 @default.
- W2163040657 hasConcept C126042441 @default.
- W2163040657 hasConcept C126980161 @default.
- W2163040657 hasConcept C136085584 @default.
- W2163040657 hasConcept C162996421 @default.
- W2163040657 hasConcept C171250308 @default.
- W2163040657 hasConcept C177409738 @default.
- W2163040657 hasConcept C190694206 @default.
- W2163040657 hasConcept C192562407 @default.
- W2163040657 hasConcept C199360897 @default.
- W2163040657 hasConcept C204223013 @default.
- W2163040657 hasConcept C2779227376 @default.
- W2163040657 hasConcept C41008148 @default.
- W2163040657 hasConcept C49040817 @default.
- W2163040657 hasConcept C53524968 @default.
- W2163040657 hasConcept C76155785 @default.
- W2163040657 hasConceptScore W2163040657C113775141 @default.
- W2163040657 hasConceptScore W2163040657C11413529 @default.
- W2163040657 hasConceptScore W2163040657C126042441 @default.
- W2163040657 hasConceptScore W2163040657C126980161 @default.
- W2163040657 hasConceptScore W2163040657C136085584 @default.
- W2163040657 hasConceptScore W2163040657C162996421 @default.
- W2163040657 hasConceptScore W2163040657C171250308 @default.
- W2163040657 hasConceptScore W2163040657C177409738 @default.
- W2163040657 hasConceptScore W2163040657C190694206 @default.
- W2163040657 hasConceptScore W2163040657C192562407 @default.
- W2163040657 hasConceptScore W2163040657C199360897 @default.
- W2163040657 hasConceptScore W2163040657C204223013 @default.
- W2163040657 hasConceptScore W2163040657C2779227376 @default.
- W2163040657 hasConceptScore W2163040657C41008148 @default.
- W2163040657 hasConceptScore W2163040657C49040817 @default.
- W2163040657 hasConceptScore W2163040657C53524968 @default.
- W2163040657 hasConceptScore W2163040657C76155785 @default.
- W2163040657 hasLocation W21630406571 @default.
- W2163040657 hasOpenAccess W2163040657 @default.
- W2163040657 hasPrimaryLocation W21630406571 @default.
- W2163040657 hasRelatedWork W1937820206 @default.
- W2163040657 hasRelatedWork W1996426988 @default.
- W2163040657 hasRelatedWork W2021819509 @default.
- W2163040657 hasRelatedWork W2029079688 @default.
- W2163040657 hasRelatedWork W2054704405 @default.
- W2163040657 hasRelatedWork W2077286051 @default.
- W2163040657 hasRelatedWork W2090745657 @default.
- W2163040657 hasRelatedWork W2163040657 @default.
- W2163040657 hasRelatedWork W2793157920 @default.
- W2163040657 hasRelatedWork W4281746028 @default.
- W2163040657 isParatext "false" @default.
- W2163040657 isRetracted "false" @default.
- W2163040657 magId "2163040657" @default.
- W2163040657 workType "article" @default.