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- W2163258984 endingPage "045014" @default.
- W2163258984 startingPage "045014" @default.
- W2163258984 abstract "An electron-emitting probe has been used to measure the temporal evolution of the plasma potential Vp along a line from target (Ti) to substrate above the racetrack in a high-power impulse magnetron sputtering discharge pulsed at 100 Hz. The 20 ns time-resolution of the probe allowed us to observe the highly dynamic nature of Vp as the discharge voltage waveform develops, with large negative Vp values (−210 V) and strong potential gradients existing in the magnetic trap region in the first 6 to 8 µs. After 55 to 60 µs, Vp is elevated towards ground potential (0 V) and the bulk electric field collapses. Outside the magnetic trap, i.e. on the open field lines, Vp reveals much smaller axial and temporal variations, similar to those observed in conventional pulsed dc magnetrons." @default.
- W2163258984 created "2016-06-24" @default.
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- W2163258984 creator A5088586898 @default.
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- W2163258984 date "2010-06-15" @default.
- W2163258984 modified "2023-10-14" @default.
- W2163258984 title "The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate" @default.
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- W2163258984 doi "https://doi.org/10.1088/0963-0252/19/4/045014" @default.
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