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• W2164299968 abstract "In this letter, the incorporation of Si implantation into AlGaN-GaN high-electron mobility transistor (HEMT) processing has been demonstrated. An ultrahigh-temperature (1500/spl deg/C) rapid thermal annealing technique was developed for the activation of Si dopants implanted in the source and drain. In comparison to control devices processed by conventional fabrication, the implanted device with nonalloyed ohmic contact showed comparable device performance with a contact resistance of 0.4 /spl Omega//spl middot/mm, I/sub max/ of 730 mA/mm, f/sub t//f/sub max/ of 26/62 GHz, and a power of 3.4 W/mm on sapphire. These early results demonstrate the feasibility of implantation incorporation into GaN-based device processing as well as the potential to increase yield, reproducibility, and reliability in AlGaN-GaN HEMTs." @default.
• W2164299968 created "2016-06-24" @default.
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• W2164299968 date "2005-05-01" @default.
• W2164299968 modified "2023-09-26" @default.
• W2164299968 title "Ion implanted AlGaN-GaN HEMTs with nonalloyed Ohmic contacts" @default.
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• W2164299968 doi "https://doi.org/10.1109/led.2005.846583" @default.
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