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- W2164516587 abstract "This work presents wafer level deposition of thin polyvinylidene fluoride-trifluoroethylene P(VDF-TrFE) films by spin coating and their further patterning by dry etching. Uniform and controlled thicknesses were obtained over a large area (4 inch Si wafer) by varying the concentration of solution and the spinnerpsilas speed. Absence of any standard method makes it difficult to etch the polymer films from places like pads. A new dry etch recipe, developed for this purpose was used for the selective etching of polymer films. <i xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>In</i> <i xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>situ</i> polarization of the polymer film has also been addressed." @default.
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- W2164516587 date "2008-10-01" @default.
- W2164516587 modified "2023-09-25" @default.
- W2164516587 title "Deposition, processing and characterization of P(VDF-TrFE) thin films for sensing applications" @default.
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- W2164516587 doi "https://doi.org/10.1109/icsens.2008.4716484" @default.
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