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• W2164984967 abstract "Abstract Cluster-based nanostructured films of Si clusters embedded in SiO nanoparticles have been prepared by low energy deposition of SiO cluster beam formed by inert gas aggregating method. The microstructures of the nanofilms have been characterized by TEM and the chemical components of the nanofilms have been analyzed by XPS spectra. It is shown that the film is assembled by the ultrafine spherical nanoparticles, which are distributed randomly and uniformly in the film, while the Si clusters produced by SiO disproportionation reaction are embedded dispersedly in the nanoparticles. Furthermore, the photoluminescence properties of the films have been measured and a blue PL band at wavelength of 400 nm with a shoulder peak at 393 nm has been observed. The PL band at 400 nm may be attributed to quantum confinement effect of the Si cores confined in SiO nanoparticles and energy potential barrier effect of outer SiO layer, while the 393 nm PL shoulder peak may be caused by the oxygen-deficient-associated defect centers." @default.
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• W2164984967 date "2001-03-01" @default.
• W2164984967 modified "2023-09-26" @default.
• W2164984967 title "Nanofilms of Si clusters confined in SiO nanoparticles prepared by low energy cluster beam deposition" @default.
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• W2164984967 doi "https://doi.org/10.1016/s0375-9601(01)00078-0" @default.
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