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- W2167307892 abstract "A new nanopolycrystalline vanadium dioxide (VO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> ) thin film has been prepared. The thin film is fabricated by reaction-ion sputtering and post-annealing process .The average grain size is 8-10nm, the phase transition temperature drops down to 35°C, and the temperature coefficiency of resistance (TCR) is -6~7%/K in semiconductor zone. However, the average grain size of conventional microstructure VO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> is 1~2μm and TCR is about -2%/K. 64×2 linear uncooled microbolometers with pixel size 50μm×50μm have been fabricated based on the nanopolycrystalline VO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> thin films and conventional microstructure VO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> thin films. The characteristics of the micrbolometer arrays are investigated in the spectral region of 8-12μm. The test indicates that the performance of the sensor based on nanopolycrystalline VO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> is nearly 3 times higher than that based on conventional microstructure VO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> thin film." @default.
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- W2167307892 date "2007-08-01" @default.
- W2167307892 modified "2023-09-27" @default.
- W2167307892 title "Characterization of Microbolometer Based on Nanopolycrystal VO2 Thin Films" @default.
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- W2167307892 doi "https://doi.org/10.1109/nano.2007.4601414" @default.
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