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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2167883929> ?p ?o ?g. }

• W2167883929 abstract "This article describes a new generation of low temperature argon (Ar) sputtering preclean. A ceramic electrostatic chuck (E-Chuck) was integrated to provide active wafer cooling. Wafer temperature, which is critical to gate oxide degradation in a plasma ion bombardment and charging environment, was reduced from 250/spl deg/C to 75/spl deg/C. This significantly improved the antenna yield due to reduced gate oxide damage and achieved the same etch performance." @default.
• W2167883929 created "2016-06-24" @default.
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• W2167883929 date "2003-01-20" @default.
• W2167883929 modified "2023-09-25" @default.
• W2167883929 title "Gate oxide damage reduction and antenna yield improvement using low temperature preclean for sub-0.25 μm metallization" @default.
• W2167883929 cites W1985162339 @default.
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• W2167883929 doi "https://doi.org/10.1109/iitc.1999.787100" @default.
• W2167883929 hasPublicationYear "2003" @default.
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