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- W2167914207 abstract "The question of selectivity (on metal vs. insulator) in the growth of copper thin films from organometallic precursors is addressed by studying the adsorption of Cu(hfac)(vtms) (where hfac = 1,1,1,5,5,5‐hexafluoroacetylacetonate and vtms = vinyltrimethylsilane) on high surface area silica using transmission infrared spectroscopy. No deposition is observed on dehydrated . In the presence of adsorbed, hydrogen bonded OH (OD) groups (from the dissociative adsorption of either water or ), thin film growth is nucleated and selectivity is lost. In addition, temperature‐programmed desorption is employed to study the bonding of a number of neutral ligands to Cu(100). This information is then used to correlate the activation energy for desorption with the observed selectivity of a series of CuI β‐diketonates." @default.
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- W2167914207 date "1992-11-01" @default.
- W2167914207 modified "2023-10-09" @default.
- W2167914207 title "Selectivity and Copper Chemical Vapor Deposition" @default.
- W2167914207 doi "https://doi.org/10.1149/1.2069070" @default.
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