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- W2167953810 abstract "Abstract The decomposition reaction of CH3CN induced by the microwave discharge flow of Ar was applied to the formation of hydrogenated amorphous carbon nitride (a-CNx:H) films. A discussion was developed on whether CN(X2Σ+) radicals are the dominant source of N atoms of films based on the ratios of the fluxes Φa-CN/ΦCN(X) evaluated for the cases of CH3CN and BrCN as the starting materials. The flux of CN(X2Σ+) radicals arrived onto the substrate surface, ΦCN(X), was evaluated from the number density of CN(X2Σ+) radicals determined from the intensity measurement of the laser-induced fluorescence spectrum of the CN(A2Πi–X2Σ+), 4–0 band together with the flow speed measured by the time-resolved emission. The flux of N atoms incorporated into films, Φa-CN, was evaluated from the atomic-composition analysis by XPS and the mass of film. According to the discussions on the difference of the above ratios and on the electron densities in the reaction region, CN(X2Σ+) radicals are suggested to be the dominant N source of a-CNx:H films." @default.
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- W2167953810 date "2012-04-01" @default.
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- W2167953810 title "Precursors of a-CNx(:H) films from the decompositions of BrCN and CH3CN with the discharged products of Ar" @default.
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- W2167953810 doi "https://doi.org/10.1016/j.diamond.2011.12.026" @default.
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