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- W2168771057 abstract "In this paper, we describe the effects that five metallic contaminants have on the electrical property of an ultrathin gate oxide. We found that, among five metallic contaminants, Fe and Ni resulted in the lowest electric breakdown fields and charge-to-breakdown ratios and the highest leakage currents and interface state densities . On the other hand, Ca-contaminated devices exhibit a lower leakage current and and a higher than did the other metals." @default.
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- W2168771057 date "2005-01-01" @default.
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- W2168771057 title "Effects of Metallic Contaminants on the Electrical Characteristics of Ultrathin Gate Oxides" @default.
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- W2168771057 doi "https://doi.org/10.1149/1.1945367" @default.
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