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- W2169328455 abstract "We present a method for local etching of the tip region of insulator-coated carbon nanotubes (CNTs) towards passivated nanoprobes. By reactive ion etching (RIE), a 20-nm-thick SiO 2 layer, which was uniformly wrapped around vertically oriented CNTs, was selectively removed from the tip, maintaining the crystallinity of inner CNT. It was found that the length of exposed CNT is controlled via etching time at an etching rate of 16 nm/min. This local etching was achieved by RIE using CF 4 as an etchant, and photoresist as a passivation mask." @default.
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- W2169328455 date "2004-07-01" @default.
- W2169328455 modified "2023-09-25" @default.
- W2169328455 title "Local Etching of Insulator-Coated Carbon Nanotubes towards Passivated Nanoprobes" @default.
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- W2169328455 doi "https://doi.org/10.1143/jjap.43.l987" @default.
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