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- W2171348049 abstract "Abstract This paper first summarizes the influence of the molecular weight of the novolak-based photoresists on the different microlithographic steps: film deposition, soft bake, exposure, and hard bake. The second part deals with the use of gel permeation chromatography (GPC) for characterizing the photoresists. In order to convert elution curves into molecular weight distribution information, a calibration method is needed. The usual calibration techniques are poorly adapted to the analysis of photoresists. The proposed calibration method uses the first observable low molecular weight oligomers on the chromatogram as a standard. It is shown that experimental results are not dependent on the column set." @default.
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- W2171348049 date "1999-02-01" @default.
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- W2171348049 title "Hot-carrier-induced abnormal gm degradation in sub-0.1-μm-channel nMOSFETs/SIMOX with LDD structure" @default.
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- W2171348049 doi "https://doi.org/10.1016/s0167-9317(98)00282-2" @default.
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