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• W2173183669 abstract "We have fabricated high-quality thin films of the transparent conducting anatase Nb:TiO2 on glass substrates through atomic layer deposition, and a subsequent reductive heat treatment of the as-deposited amorphous films. Hall-effect measurements and Drude-fitting of the Vis-NIR spectra indicate that for lightly doped films deposited at temperatures around 170 °C, grain boundary scattering becomes negligible and the mobility is predominately limited by phonon-electron scattering inherent to the anatase lattice and by impurities. Simultaneously, such lighter doping leads to reduced plasma absorption, thereby improving material's performance as a transparent conductor." @default.
• W2173183669 created "2016-06-24" @default.
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• W2173183669 date "2015-11-09" @default.
• W2173183669 modified "2023-10-03" @default.
• W2173183669 title "Suppressed grain-boundary scattering in atomic layer deposited Nb:TiO2 thin films" @default.
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• W2173183669 doi "https://doi.org/10.1063/1.4935425" @default.
• W2173183669 hasPublicationYear "2015" @default.
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