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• W2174518589 abstract "Extreme ultraviolet lithography (EUV) advances printability of small size features for both memory and logic semiconductor devices. It promises to bring relief to the semiconductor manufacturing industry, removing the need for multiple masks in rendering a single design layer on wafer. However, EUV also brings new challenges, one of which is of mask defectivity. For this purpose, much of the focus in recent years has been in finding ways to adequately detect, characterize, and reduce defects on both EUV blanks and patterned masks. In this paper we will present an efficient way to classify and disposition EUV mask defects through a new algorithm developed to classify defects located on EUV photomasks. By processing scanning electronmicroscopy images (SEM) of small regions of a photomask, we extract highdimensional local features Histograms of Oriented Gradients (HOG). Local features represent image contents compactly for detection or classification, without requiring image segmentation. Using these HOGs, a supervised classification method is applied which allows differentiating between nondefective and defective images. In the new approach we have developed a superior method of detection and classification of defects, using mask and supporting mask printed data from several metallization masks. We will demonstrate that use of the HOG method allows realtime identification of defects on EUV masks regardless of geometry or construct. The defects identified by this classifier are further divided into subclasses for mask defect disposition: foreign material, foreign material from previous step, and topological defects. The goal of disposition is to categorize on the images into subcategories and provide recommendation of prescriptive actions to avoid impact on the wafer yield." @default.
• W2174518589 created "2016-06-24" @default.
• W2174518589 creator A5014350074 @default.
• W2174518589 creator A5044266820 @default.
• W2174518589 creator A5073525077 @default.
• W2174518589 creator A5084525997 @default.
• W2174518589 creator A5087265270 @default.
• W2174518589 date "2015-10-23" @default.
• W2174518589 modified "2023-09-23" @default.
• W2174518589 title "New method of detection and classification of yield-impacting EUV mask defects" @default.
• W2174518589 cites W1970898163 @default.
• W2174518589 cites W1978138455 @default.
• W2174518589 cites W1986119799 @default.
• W2174518589 cites W1995660891 @default.
• W2174518589 cites W2029904567 @default.
• W2174518589 cites W2052740951 @default.
• W2174518589 cites W2080586016 @default.
• W2174518589 cites W2092966059 @default.
• W2174518589 cites W2100805904 @default.
• W2174518589 cites W2161969291 @default.
• W2174518589 cites W2168116570 @default.
• W2174518589 cites W3150329878 @default.
• W2174518589 cites W4239510810 @default.
• W2174518589 cites W82130502 @default.
• W2174518589 doi "https://doi.org/10.1117/12.2197871" @default.
• W2174518589 hasPublicationYear "2015" @default.
• W2174518589 type Work @default.
• W2174518589 sameAs 2174518589 @default.
• W2174518589 citedByCount "2" @default.
• W2174518589 countsByYear W21745185892016 @default.
• W2174518589 crossrefType "proceedings-article" @default.
• W2174518589 hasAuthorship W2174518589A5014350074 @default.
• W2174518589 hasAuthorship W2174518589A5044266820 @default.
• W2174518589 hasAuthorship W2174518589A5073525077 @default.
• W2174518589 hasAuthorship W2174518589A5084525997 @default.
• W2174518589 hasAuthorship W2174518589A5087265270 @default.
• W2174518589 hasConcept C120665830 @default.
• W2174518589 hasConcept C121332964 @default.
• W2174518589 hasConcept C146024833 @default.
• W2174518589 hasConcept C146617872 @default.
• W2174518589 hasConcept C14737013 @default.
• W2174518589 hasConcept C153180895 @default.
• W2174518589 hasConcept C154945302 @default.
• W2174518589 hasConcept C160671074 @default.
• W2174518589 hasConcept C162996421 @default.
• W2174518589 hasConcept C171250308 @default.
• W2174518589 hasConcept C192562407 @default.
• W2174518589 hasConcept C204223013 @default.
• W2174518589 hasConcept C205711294 @default.
• W2174518589 hasConcept C2779227376 @default.
• W2174518589 hasConcept C31972630 @default.
• W2174518589 hasConcept C41008148 @default.
• W2174518589 hasConcept C49040817 @default.
• W2174518589 hasConcept C520434653 @default.
• W2174518589 hasConcept C53524968 @default.
• W2174518589 hasConcept C89600930 @default.
• W2174518589 hasConcept C95623464 @default.
• W2174518589 hasConceptScore W2174518589C120665830 @default.
• W2174518589 hasConceptScore W2174518589C121332964 @default.
• W2174518589 hasConceptScore W2174518589C146024833 @default.
• W2174518589 hasConceptScore W2174518589C146617872 @default.
• W2174518589 hasConceptScore W2174518589C14737013 @default.
• W2174518589 hasConceptScore W2174518589C153180895 @default.
• W2174518589 hasConceptScore W2174518589C154945302 @default.
• W2174518589 hasConceptScore W2174518589C160671074 @default.
• W2174518589 hasConceptScore W2174518589C162996421 @default.
• W2174518589 hasConceptScore W2174518589C171250308 @default.
• W2174518589 hasConceptScore W2174518589C192562407 @default.
• W2174518589 hasConceptScore W2174518589C204223013 @default.
• W2174518589 hasConceptScore W2174518589C205711294 @default.
• W2174518589 hasConceptScore W2174518589C2779227376 @default.
• W2174518589 hasConceptScore W2174518589C31972630 @default.
• W2174518589 hasConceptScore W2174518589C41008148 @default.
• W2174518589 hasConceptScore W2174518589C49040817 @default.
• W2174518589 hasConceptScore W2174518589C520434653 @default.
• W2174518589 hasConceptScore W2174518589C53524968 @default.
• W2174518589 hasConceptScore W2174518589C89600930 @default.
• W2174518589 hasConceptScore W2174518589C95623464 @default.
• W2174518589 hasLocation W21745185891 @default.
• W2174518589 hasOpenAccess W2174518589 @default.
• W2174518589 hasPrimaryLocation W21745185891 @default.
• W2174518589 hasRelatedWork W1969283070 @default.
• W2174518589 hasRelatedWork W1974233575 @default.
• W2174518589 hasRelatedWork W1986384732 @default.
• W2174518589 hasRelatedWork W1990904913 @default.
• W2174518589 hasRelatedWork W2001221296 @default.
• W2174518589 hasRelatedWork W2020764220 @default.
• W2174518589 hasRelatedWork W2024103020 @default.
• W2174518589 hasRelatedWork W2046652863 @default.
• W2174518589 hasRelatedWork W2066465593 @default.
• W2174518589 hasRelatedWork W2071479361 @default.
• W2174518589 hasRelatedWork W2108903719 @default.
• W2174518589 hasRelatedWork W2168116570 @default.
• W2174518589 hasRelatedWork W2333627698 @default.
• W2174518589 hasRelatedWork W2351997809 @default.
• W2174518589 hasRelatedWork W2474191404 @default.
• W2174518589 hasRelatedWork W2765775291 @default.
• W2174518589 hasRelatedWork W2895323754 @default.
• W2174518589 hasRelatedWork W88989281 @default.
• W2174518589 hasRelatedWork W2175824415 @default.

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