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- W2181869572 abstract "Ni-Mn-Ga thin films were dc magnetron sputter deposited onto well cleaned substrates of si(100) and glass in high pure argon atmosphere of pressure of 0.01 mbar using NiMnGa alloy targets prepared in our laboratory by vacuum induction melting technique. Pristine thin films were investigated. Crystal structure of the films was studied using x-ray diffraction (XRD) technique. Microstructure of the films was investigated using scanning electron microscope (SEM). XRD reveals that the films on glass substrates are amorphous and films on si(100) substrates posses L21 structure. SEM microstructure shows that the films on si(100) are polycrystalline in pristine form." @default.
- W2181869572 created "2016-06-24" @default.
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- W2181869572 date "2013-01-01" @default.
- W2181869572 modified "2023-09-27" @default.
- W2181869572 title "Structure and Microstructure of Ni-Mn-Ga thin films" @default.
- W2181869572 hasPublicationYear "2013" @default.
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