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- W2182291597 abstract "This paper describes a parameter extraction procedure for HiSIM (Hiroshima-university STARC IGFET Model) [1] version 1.2 with the application result to practical devices. The procedure followed a traditional approach of the geometry selection for the parameter extraction. It starts with the long and wide channel (Large) device, then proceeds to the various channel length devices under the fixed wide channel width (L-array), finally to the various channel width devices under the fixed long channel length (W-array). No short and narrow channel devices (Small) are used. Semiconductor Technology Academic Research Center (STARC), Yokohama, Japan, permitted the paper author to use the practical device data which was said to be ready for 90 nm node. The result verified the scalability of HiSIM-1.2 down to 100 nm channel length with certain improvement required. The number of optimized parameters were 19. The details will be reported at Nanotech 2004 workshop on compact modeling." @default.
- W2182291597 created "2016-06-24" @default.
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- W2182291597 date "2004-01-01" @default.
- W2182291597 modified "2023-09-27" @default.
- W2182291597 title "A Trial Report: HiSIM-1.2 Parameter Extraction for 90 nm Technology" @default.
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