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- W2183083460 abstract "Quasistatic C-V measurements have been carried out on Si-SiO2-electrolyte structures. The C-V curves show a shift in voltage when the pH of the electrolyte is varied. This is due to a variation in the potential difference across the electrolyte-SiO2 interface. The shape of the C-V curves also changes; from the variation in the minimum of these curves the change in the surface state density near midgap is derived. It is found that a decrease in pH leads to a decrease in the surface state density at the Si-SiO2 interface. This decrease is believed to be caused by a hydrogen bearing species released at the SiO2-electrolyte interface and transported to the Si-SiO2 interface. The possibility of application in ISFETs is discussed." @default.
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- W2183083460 date "1978-01-01" @default.
- W2183083460 modified "2023-09-23" @default.
- W2183083460 title "THE INFLUENCE OF THE pH ON THE SURFACE STATE DENSITY AT THE SiO2-Si INTERFACE" @default.
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- W2183083460 doi "https://doi.org/10.1016/b978-0-08-023049-8.50080-4" @default.
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