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- W2185623897 abstract "Recent progress in the field of sputter depth profiling in combination with secondary ion mass spectrometry (SIMS) is reviewed briefly. Emphasis is placed on aspects of depth resolution and dosimetry." @default.
- W2185623897 created "2016-06-24" @default.
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- W2185623897 date "2001-01-01" @default.
- W2185623897 modified "2023-09-27" @default.
- W2185623897 title "Invited State of the art in high-resolution SIMS depth profiling" @default.
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