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• W2186291288 abstract "Semiconductor product value increasingly depends on equivalent scaling achieved by design and design-for- manufacturability (DFM) techniques. This talk addresses trends and a roadmap for equivalent scaling innovation at the design- interface. The first part will discuss precepts of electrical DFM. What are dominant aspects of variability and design requirements? Can designs match process, or must process inevitably adapt to designs? In what sense can concepts of virtual manufacturing or statistical optimization succeed in the design flow? How should design technology balance analyses that preserve value, versus optimizations that extend value? How should we balance preventions (correct by construction), versus early interventions, versus cures (construct by correction), versus do no harm opportunism? Or, tools that can model and predict well, versus tools that can make upstream assumptions come true? The second part will give a roadmap for electrical DFM technologies, motivated by emerging challenges (stress/strain engineering, mask errors, double-patterning lithography, etc.) and highlighting needs for ≤ 45nm nodes." @default.
• W2186291288 created "2016-06-24" @default.
• W2186291288 creator A5073558386 @default.
• W2186291288 date "2007-01-01" @default.
• W2186291288 modified "2023-09-27" @default.
• W2186291288 title "Key Directions and a Roadmap for Electrical Design for Manufacturability (Invited Talk)" @default.
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