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- W2186397108 abstract "In immersion nano-lithography, nanostructures are written on a wafer by illumination through a 200 µm thin water film that sits locally between the imaging lens and the wafer that scans horizontally at speeds up to 1 m/s. One of the important defect mechanisms in immersion lithography is the formation of air bubbles that enter the light path underneath the lens. Our combined numerical and experimental work shows that the micro-bubbles can be manipulated using ultrasonic waves, so that they can be prevented from reaching the light path during lithography. For our particular experimental conditions, micro-bubbles with radii between 25 and 100 µm can be stopped or deflected for scanning speeds up to at least 0.6 µm/s." @default.
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- W2186397108 date "2010-01-01" @default.
- W2186397108 modified "2023-09-27" @default.
- W2186397108 title "ULTRASONIC MANIPULATION OF MICRON SIZE BUBBLES IN NANO-LITHOGRAPHY" @default.
- W2186397108 hasPublicationYear "2010" @default.
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