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- W2188585112 abstract "We utilize acombination ofMOSFETgate-controlled diodeDC-IVmeasurements anda verysensitive electron spin resonance technique called spin-dependent recombination to observe andidentify defect centers generated byNBTIinfully processed SiO2-based pMOSFETs. InSiO2devices, thedefects include twoSi/SiO2 interface silicon dangling bondcenters (Pbo andPb)andmayalsoinclude anoxide silicon dangling bond center (E'.Ourobservations suggest that bothPhoandPh,defects playmajorroles while theE'defect plays asomewhat different role intheSiO2devices." @default.
- W2188585112 created "2016-06-24" @default.
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- W2188585112 date "2005-01-01" @default.
- W2188585112 modified "2023-09-26" @default.
- W2188585112 title "Observations ofNBTI-induced AtomicScale Defects" @default.
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