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- W2190752743 abstract "Novel 3D self-assembled nanopatterning is presented via tailored crumpling of chemically modified graphene. Block-copolymer self-assembly formed on a layer of chemically modified graphene provides highly dense and uniform 2D nanopatterns, and the controlled crumpling of the chemically modified graphene by mechanical instabilities realizes the controlled 3D transformation of the self-assembled nanopatterns. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article." @default.
- W2190752743 created "2016-06-24" @default.
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- W2190752743 date "2015-12-14" @default.
- W2190752743 modified "2023-10-17" @default.
- W2190752743 title "3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene" @default.
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- W2190752743 doi "https://doi.org/10.1002/adma.201504590" @default.
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