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• W2191639348 abstract "In this paper, the effects of external electric field on the work functions for Ni(001), Ni(111), HfO 2 (001) and HfO 2 (111) films and the effective work functions for Ni(001)/HfO 2 (001) and Ni(111)/HfO 2 (111) interfaces were studied by first-principles methods based on density functional theory (DFT). It is found that the work functions for all the systems change linearly with the strength of external electric field. Comparing the slopes of the work function variation versus external electric field strength for Ni, HfO 2 films and Ni/HfO 2 interfaces, we have found that the response of the effective work function to external electric field for Ni/HfO 2 interfaces is determined by the response of the HfO 2 side to external electric field." @default.
• W2191639348 created "2016-06-24" @default.
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• W2191639348 date "2015-09-17" @default.
• W2191639348 modified "2023-09-23" @default.
• W2191639348 title "Work function change of Ni, HfO₂films and Ni/HfO₂interfaces as a function of external electric field" @default.
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• W2191639348 doi "https://doi.org/10.1142/s0217979215501684" @default.
• W2191639348 hasPublicationYear "2015" @default.
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