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- W2208353407 abstract "To get insight into the selective etching of with respect to in acidic containing solutions, etch rate measurements on the (100)‐face of both materials were performed as a function of several variables. By combining these results with those of electrochemical measurements (including rotating disk electrode (RDE) and rotating ring‐disk electrode (RRDE) techniques), it was established that at an electroless etching mechanism operates, whereas at dissolution occurs by chemical etching. The observed selectivity in solutions with concentrations above 0.01 mol · liter−1 is essentially due to this difference in etching mechanism, which determines the concentration dependence of the etch rate as well as the influence of surface oxide layers on these rates." @default.
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- W2208353407 date "1995-10-01" @default.
- W2208353407 modified "2023-10-14" @default.
- W2208353407 title "Fundamental Study on the Selective Etching of Al0.25Ga0.75As Versus GaAs in Acidic Iodine Solutions" @default.
- W2208353407 doi "https://doi.org/10.1149/1.2050028" @default.
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