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• W2218756207 abstract "Using multi-step deposition mode, we developed an innovational strategy of homogenously multilayered (HM) structure to tailor the roughening kinetics of sputtered W films. Dynamic scaling analysis showed that all sublayers of HM W films exhibited the same anomalous roughening behavior, which originated from the limited surface diffusion. Intriguingly, different from its single-layered counterpart, the HM W films exhibited a suppression effect of kinetic roughening, which could be well manipulated by film modulation period. Detailed experimental characterization and phenomenological model analysis suggested that this roughening suppression arises from the multi-interruption of the continuous film roughening process, forming an interlayer interface after every interruption and restarting the sublayer roughening on the pre-sublayer surface." @default.
• W2218756207 created "2016-06-24" @default.
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• W2218756207 date "2015-11-04" @default.
• W2218756207 modified "2023-10-12" @default.
• W2218756207 title "Suppression of surface roughening kinetics of homogenously multilayered W films" @default.
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• W2218756207 doi "https://doi.org/10.1063/1.4935136" @default.
• W2218756207 hasPublicationYear "2015" @default.
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