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• W2221123913 abstract "Polycrystalline uranium dioxide thin films were grown on nickel substrates via aqueous electrodeposition of a precursor uranyl salt. The arising semiconducting uranium dioxide thin films exhibited a tower-like morphology, which may be suitable for future application in 3D solar cell applications. The thickness of the homogenous, tower-like films reached 350 nm. Longer deposition times led to the formation of thicker (up to 1.5 μm) and highly porous films." @default.
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• W2221123913 date "2015-12-01" @default.
• W2221123913 modified "2023-10-01" @default.
• W2221123913 title "Characterisation of electrodeposited polycrystalline uranium dioxide thin films on nickel foil for industrial applications" @default.
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• W2221123913 doi "https://doi.org/10.1016/j.tsf.2015.11.030" @default.
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