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- W2221569197 abstract "Short introductive summary We present different new concepts to improve the light trapping in thin film silicon solar cells on steel foil. One of these concepts is to incorporate a textured back reflector, where the light scattering texture is made by Nano-Imprint Lithography (NIL). In this concept, we imprint a texture in a UV-hardening lacquer that has been applied on the steel foil. This texture then is covered by a silver layer, serving as a reflector and a back contact. Any arbitrary texture can be imprinted, and we will present results for random and periodic textures showing that we can obtain short circuit currents (Jsc) of more than 24 mA/cm2 for cells with a nc-Si absorber layer of only 1 micron. Another approach is to replace this silver layer by a white back reflector (WBR). Since, in contrast to the common utilization of a WBR in superstrate cells, in substrate-type n-i-p cells the WBR has to undergo all the different steps of the cell processing, there are strict requirements to the material of the WBR, in terms of degasing and temperature stability. We have identified suitable materials and applied these in a-Si solar cells. The Jsc values of these cells were even slightly higher than those of cells with a NIL back reflector. To our knowledge this is the first application of a WBR in substrate-type cells. Application of WBR in single junction nc-Si cells and in tandem cells is ongoing and the results will be presented at the conference. Finally, we will also present a-Si/nc-Si tandem cells on foil in which we combine these back reflector concepts with implementation of an intermediate reflector (IR) based on doped SiOx." @default.
- W2221569197 created "2016-06-24" @default.
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- W2221569197 date "2014-11-07" @default.
- W2221569197 modified "2023-09-23" @default.
- W2221569197 title "Advanced Light Management for Thin Film Silicon Solar Cells on Foil" @default.
- W2221569197 doi "https://doi.org/10.4229/eupvsec20142014-3cv.1.8" @default.
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