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- W2227679198 abstract "在6—300K下,利用红外傅里叶光谱仪研究了400—4000cm-1间的硅、锗中氧的红外吸收。采用高分辨条件时,分辨率可达0.5cm-1。研究了在低温下利用硅的1106cm-1吸收峰和锗的855cm-1吸收峰探测硅和锗氧含量的探测限和误差。若样品厚度为2cm,估计在20K下,硅中氧含量探测限～9.6×1014氧原子·cm-3,锗中氧含量探测限～3.0×1014氧原子·cm-3。同时,对不同生长条件下直拉锗单晶的氧含量进行了研究,并与用锂沉淀法所求得的锗中氧含量加以比较。对不同氧含量的硅样品的1106cm-1吸收峰在6—300K的变化进行了观察和讨论。" @default.
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- W2227679198 date "1980-01-01" @default.
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- W2227679198 title "INFRARED ABSORPTION OF OXYGEN IN SILICON AND GERMANIUM AT LOW TEMPERATURES" @default.
- W2227679198 doi "https://doi.org/10.7498/aps.29.867" @default.
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