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- W2230854485 abstract "Transparent conducting oxides (TCO) are used for different applications like heatable glazing or transparent electrodes for displays or solar cells. For most of these applications tin-doped indium oxide (ITO) is used. Because of the scarcity of indium involving increasing prizes fluorine-doped tin dioxide (FTO) is an interesting alternative. A high performance of the TCO films is required especially for solar cell applications. Low sheet resistance ( 85 %) and a rough surface texture for increased light trapping are the benchmark for a useful front electrode. In this work, a chemical vapor deposition (CVD) process was developed working at atmospheric pressure and comparatively low temperatures. This type of processing is a key issue for the preparation of large area coatings at low cost in industrial applications. In this work functional coatings of SnO2 and SnO2:F processed by atmospheric pressure chemical vapor deposition (APCVD) were investigated. The films were prepared on various substrates such as glass and steel resulting in highly conductive and transparent films at different film thicknesses (100 nm – 1000 nm). The film thicknesses as the optical constants (index of refraction and extinction coefficient) were determined by UV-VIS-NIR ellipsometry (multi-angle). Typically the index of reflection is in the range of 1.8 < n < 1.9 @550 nm. The process parameters allow adjusting the nanostructured surface topology. On this account the surface roughness can be adjusted in the range of 7 nm < Ra< 40 nm. The surface texture was detected by atomic force microscopy (AFM) (see Figure 1)." @default.
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- W2230854485 date "2009-01-01" @default.
- W2230854485 modified "2023-09-26" @default.
- W2230854485 title "Atmospheric Pressure CVD of Tin Oxide and Fluorine-Doped Tin Oxide" @default.
- W2230854485 doi "https://doi.org/10.1149/ma2009-02/34/2554" @default.
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