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- W2234855066 abstract "Titania films have attracted a great deal of interest for use as a photo-catalyst for the degradation of organic materials, with the potential to create selfcleaning or anti-bacterial surfaces. [1, 2] Titania may exist in three crystal phases; anatase, rutile and brookite. It has been found that the anatase form has increased photocatalytic activity compared to the rutile form, which in turn is superior to polycrystalline titania with amorphous titania showing the least activity. 4] High substrate temperatures in excess of 400 °C are generally required to produce crystalline titania via conventional CVD. [5, 6] Films have also been produced by sol-gel processes, but again these were typically annealed at 450oC to achieve the desired properties. [7] This poster discusses the low temperature deposition of titania films via atmospheric pressure, glow discharge CVD with a view to providing an active, self cleaning surface at greatly reduced temperatures. The films were deposited on glass substrates and characterised by XPS, RBS and XRD. The films were annealed at various temperatures to achieve anatase morphology. Activity was assessed via the degradation of stearic acid on exposure to ultra-violet light, providing an indication of self cleaning ability." @default.
- W2234855066 created "2016-06-24" @default.
- W2234855066 date "2009-01-01" @default.
- W2234855066 modified "2023-09-25" @default.
- W2234855066 title "Photocatalytic Surfaces via Low Temperature Atmospheric Pressure Plasma" @default.
- W2234855066 doi "https://doi.org/10.1149/ma2009-02/34/2582" @default.
- W2234855066 hasPublicationYear "2009" @default.
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