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- W2237507581 abstract "GaAsBi thin layers of 1μm thickness were grown by molecular-beam epitaxy on GaAs substrates at a growth temperature of 350 o C. To investigate the effects of the heat treatment on the optical and structural properties of these layers, annealing for a set were carried out at 200 o C and 300 o C for 3 h under a nitrogen gas conditions in a tubular furnace, and another set of layers for 90 s at temperature ranges from 600 to 700 o C in a hydrogen and argon gas mixture. The optical properties such as PL (Photoluminescence) of the as-grown and annealed samples were then characterized. The effect of growth temperature, substrate orientation, nitrogen doping and the annealing effect on the optical properties were presented in full details." @default.
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- W2237507581 date "2015-01-01" @default.
- W2237507581 modified "2023-09-27" @default.
- W2237507581 title "Effects of Thermal Annealing on the Spectral Properties of GaAsBi Alloys Grown by Molecular Beam Epitaxy (MBE)" @default.
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