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- W2240610576 abstract "In this work, we use photolithography in order to fabricate micro-grating structures on silicon. The first step of device was coated by 3.5 μm thick silicon dioxide (SiO 2 ) film on top side, whereas the bottom side was coated with 4.5 μm. Next, we deposited silicon nitride (Si 3 N 4 ) film of 2 μm by plasma-enhanced chemical vapor deposition, and used photolithography to prepare the gratings. We compared micro-grating period sizes of 1 μm, 0.8 μm and 0.5 μm, and found the 0.5 μm gave the best sensitivity. These devices can be applied with detection in biosensing in the future." @default.
- W2240610576 created "2016-06-24" @default.
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- W2240610576 date "2015-10-01" @default.
- W2240610576 modified "2023-09-27" @default.
- W2240610576 title "Photolithographic Process for Creating Micro-Grating on Silicon Substrate for Biosensor Application" @default.
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- W2240610576 doi "https://doi.org/10.4028/www.scientific.net/amm.804.159" @default.
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