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• W2242226268 abstract "Charge trapping behavior in Al 2 O 3 /SiC MOS structures was investigated by C-V hysteresis measurements in combination with XPS analysis. According to the quadratic fit of C-V hysteresis vs. t ox curves, the density of the injected charges in the bulk Al 2 O 3 films are the same under different maximum electric field, while the density of sheet charges increase with the increase of maximum electric field. Thus, a simple sheet charge model has been used to evaluate the actual effect of the electron injection phenomenon. The charge trapping levels can be as high as 10 13 cm -2 , indicating the importance of C-V hysteresis in Al 2 O 3 /SiC structures. All the trapping charges are found to be located at a distance ranging from 3 to 4 nm from the interface. Furthermore, no detectable interface oxide between Al 2 O 3 and SiC has been found through our XPS measurements. We conclude that the origin of charge trapping sites in Al 2 O 3 /SiC structures is the native defects in ALD Al 2 O 3 layer and predominantly the border traps in the Al 2 O 3 near the oxide/semiconductor interface." @default.
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• W2242226268 date "2015-06-01" @default.
• W2242226268 modified "2023-10-12" @default.
• W2242226268 title "An Investigation of Capacitance-Voltage Hysteresis in Al₂O₃/SiC MIS Capacitors" @default.
• W2242226268 cites W1653805150 @default.
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• W2242226268 doi "https://doi.org/10.4028/www.scientific.net/msf.821-823.516" @default.
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