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- W2243328166 abstract "The surface modification can be used to reduce the surface reflectance and thereby improve the conversion efficiency of silicon solar cells. The technique widely used for this purpose in industrial applications is anisotropic chemical texturization, using an alkaline solution, NaOH solution, etc [1]. However, the reflectance of the textured structures is usually over 10% in the range of wavelength from 300 to 1200 nm. Moreover, the pyramid texturing has a few disadvantages. Firstly, the results are not always reproducible, secondly, it is difficult to apply the standard industrial process due to its high cost. In recent years, tetramethylammonium hydroxide solution has been used for random pyramid texturization [2]. In order to achieve a lower reflectance, antireflection coating (ARC) is widely used for silicon solar cell technology. ARC presents thin film of transparent material with refractive index (n) between those of air (n=1) and Si (n=3,84). ARCs are generally fabricated by plasma-enhanced chemical vapor deposition, which increases in the cost of solar cells [3]. The solar radiation spectrum expands from ultraviolet and visible to infrared wavelengths. A single-layer antireflection coating allows a reduction in reflectance only in a narrow wavelength region of the solar spectrum. Moreover, the effective reflectance of such coatings still represents about 11% of the incident photon flux [4]. Single-layer LARCs include SiNx, Ta2O3, ZnS, Al2O3, etc. A wider spectral range (450—700 nm) and lower effective reflectance may be obtained by increasing the number of layers, i. e. a double-layers antireflection coating [5]. The most efficient systems are currently the ZnS/MgF2, SiO2/TiO2 doublelayer coatings. However, these layers are deposited in vacuum by PECVD method which is a major drawback for low-cost industrial applications. In the present paper the method is shown to improve the photovoltaic parameters of screenprinted silicon solar cells by nanoporous silicon film formation on the frontal surface of the cell using the electrochemical etching. The possible mechanisms responsible for observed improvement of silicon solar cell performance are discussed." @default.
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- W2243328166 date "2012-01-01" @default.
- W2243328166 modified "2023-10-17" @default.
- W2243328166 title "Performance improvement of silicon solar cells by nanoporous silicon coating" @default.
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