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- W2243340867 abstract "Breakdown characteristics of the thin gate oxide are measured under constant voltage stresses. Breakdown mechanism of time-dependent dielectric breakdown are studied and effects of the areas of the gate oxide on breakdown characteristics are discussed. Breakdown charge Q BD is measured and analyzed, the results show that breakdown charge Q BD is not constant, it depends on the areas of the gate oxide and the voltage of the gate. Relative coefficients are fitted and analytical expression of Q BD is presented in the paper." @default.
- W2243340867 created "2016-06-24" @default.
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- W2243340867 date "2000-01-01" @default.
- W2243340867 modified "2023-09-26" @default.
- W2243340867 title "STUDY ON PARAMETER CHARACTERIZATION OF THIN GATE OXIDE TDDB BREAKDOWN" @default.
- W2243340867 doi "https://doi.org/10.7498/aps.49.1163" @default.
- W2243340867 hasPublicationYear "2000" @default.
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