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- W2244816277 abstract "BaTiO 3 crystal film has the very high electro-optic effect, so it has important research value for thin film waveguide electro-optic modulators. In this work, BPM software is used to simulate the single-mode condition of ridge waveguide at first, then BaTiO 3 film waveguide structure is designed with suitable film thickness.BaTiO 3 waveguide thin films are grown by pulsed laser deposition on single crystal MgO substrate. The BaTiO 3 thin-film crystalline structures grown at different temperature sand different laser powers were analyzed by using X ray diffraction , which showed the BaTiO 3 films have a priority crystallization direction and good crystallization quality at 750°C grown temperature. For the optimally-designed waveguide structures, the PECVD technique and ICP plasma etching method are employed to coat and etch Si 3 N 4 films, respectively. Through the optimization of main process parameters, 60 sccm reaction gas flow and 150 nm/min etching speed are finally selected to create the ridge waveguides, and consequently, the surface roughness of Si 3 N 4 film waveguide reaches 2.3 nm." @default.
- W2244816277 created "2016-06-24" @default.
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- W2244816277 date "2014-04-01" @default.
- W2244816277 modified "2023-09-27" @default.
- W2244816277 title "Design and Fabrication of BaTiO<sub>3</sub> Crystal Thin-Film Waveguides" @default.
- W2244816277 cites W1964886525 @default.
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- W2244816277 doi "https://doi.org/10.4028/www.scientific.net/kem.609-610.201" @default.
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