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• W2246404689 abstract "In this paper we explore the benefit of combining High Resolution X-Ray Reciprocal Space Mapping (HR-RSM) and Dark-Field Electron Holography (DFEH) techniques for strain characterization of thin pMOS-like structures. We are able to simulate the measured HR-RSM from the displacement field extracted by DFEH. This is a first step developing High Resolution X-Ray Diffraction (HRXRD) as a viable technique for in-line strain metrology." @default.
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• W2246404689 date "2015-07-01" @default.
• W2246404689 modified "2023-10-18" @default.
• W2246404689 title "Combining high-resolution X-ray reciprocal space mapping and dark-field electron holography for strain analysis in 20 nm pMOS structures" @default.
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• W2246404689 doi "https://doi.org/10.1109/nano.2015.7388727" @default.
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