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- W2247137937 abstract "Pb 0.97 La 0.02 Zr 0.95 Ti 0.05 O 3 (PLZT) antiferroelectric thin films were prepared on Pt (111)/ Ti/SiO 2 /Si (100) substrates by a sol-gel process. The influences of annealing temperature on the structures and dielectric properties of the PLZT antiferroelectric thin films were investigated. And the phase structure and crystal orientation were studied by X-ray diffraction analyses (XRD). The antiferroelectric characterization of the PLZT thin films annealed at different temperature was demonstrated by P(polarization)-E(electric field) and C(capactitance)-E(electric field) curves. The maximum polarizations for the films annealed at 650°C, 700°C and 750°C were 35μC/cm 2 , 42μC/cm 2 and 47μC/cm 2 , respectively. The temperature dependent of the dielectric constant and loss was measured under the frequency 1, 10, 100 and 1000 kHz. The films annealed at 700°C have high (100)-preferred orientation and excellent dielectric properties." @default.
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- W2247137937 date "2011-07-01" @default.
- W2247137937 modified "2023-10-18" @default.
- W2247137937 title "Dielectric Properties of Pb<sub>0.97</sub>La<sub>0.02</sub>Zr<sub>0.95</sub>Ti<sub>0.05</sub>O<sub>3</sub> Antiferroelectric Thin Films Prepared at Different Annealing Temperatures" @default.
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- W2247137937 doi "https://doi.org/10.4028/www.scientific.net/amr.287-290.2460" @default.
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