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- W2247284966 abstract "GaN nanorods have been formed by inductive coupled plasma (ICP) etching in BCl3/Cl2 plasma. Nanostructures were formed only in the initially titanium masked area, wherein the dimensions of mask pattern do not define dimensions of nanorods, but the region of structure formation only. It has been found that density of nanorods strongly depends on process parameters, such as RF and ICP power, and gas pressure. Possible mechanisms of nanorods formation have been suggested, without however decisive conclusion." @default.
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- W2247284966 date "2015-07-01" @default.
- W2247284966 modified "2023-09-24" @default.
- W2247284966 title "Novel approach of top-down GaN nanorods fabrication" @default.
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- W2247284966 doi "https://doi.org/10.1109/nano.2015.7388779" @default.
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