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- W2247294642 abstract "We report a novel FinFET-based high electron mobility transistor (FinHEMT) with a strained-silicon (s-Si) channel proposed by a simple Si-compatible fabrication process. Through TCAD device simulation, proposed FinHEMT can be used as high-performance low-power transistor with high on-current (> 1 mA/µm) and low off-current (∼10 pA/µm). Channel electron mobility in s-Si FinHEMT is highly enhanced over 1000 cmWs, which is 4 times higher than that of FinFET." @default.
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- W2247294642 date "2015-07-01" @default.
- W2247294642 modified "2023-09-26" @default.
- W2247294642 title "FinHEMT: FinFET-based high electron mobility transistor with strained silicon channel" @default.
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- W2247294642 doi "https://doi.org/10.1109/nano.2015.7388761" @default.
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