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- W2247402216 abstract "Mn-doped ZnO thin films were prepared on SiO 2 substrates by using a radio-frequency(rf) magnetron sputtering in order to investigate structure and optical proprieties of the films. X-ray diffraction (XRD), Atomic force microscope (AFM) and UV-VIS spectrophotometry were employed to characterize the Mn-doped ZnO films. The results showed that the shape of the XRD spectrum was remarkably similar to that of the un-doped ZnO film; the film had mainly (002) peak, and indicate that the structure of the films was not disturbed by Mn-doped. The film had rather flat surfaces with the peak-to-tail roughness of about 25nm. Mn-doping changed the band gap of the films, which increased with the increase of the Mn content." @default.
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- W2247402216 date "2012-08-01" @default.
- W2247402216 modified "2023-09-26" @default.
- W2247402216 title "Preparation and Characterization of Zn<sub>1-X</sub>Mn<sub>x</sub>O Thin Films on SiO<sub>2</sub> Substrates" @default.
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- W2247402216 doi "https://doi.org/10.4028/www.scientific.net/amr.560-561.820" @default.
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