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- W225485807 abstract "Ultraviolet nanoimprint lithography has great potential for commercial device applications that are closest to production such as optical gratings, planar waveguides, photonic crystals, semiconductor, displays, solar cell panel, sensors, highbrightness LEDs, OLEDs, and optical data storage. I report and demonstrate the newly TiO<sub>2</sub>-SiO<sub>2</sub> ultraviolet curable materials with 20-25 wt% ratio of high titanium for CF<sub>4</sub>/O<sub>2</sub> etch selectivity using nanoimprint lithography process. The multiple structured three-dimensional micro- and nanolines patterns were observed to be successfully patterned over the large areas. The effect of titanium concentration on CF<sub>4</sub>/O<sub>2</sub> etch selectivity with pattern transferring carbon layer imprinting time was investigated. CF<sub>4</sub>/O<sub>2</sub> etching rate of the TiO<sub>2</sub>-SiO<sub>2</sub> ultraviolet curable material was approximately 3.8 times lower than that of the referenced SiO<sub>2</sub> sol-gel ultraviolet curable material. The TiO<sub>2</sub>-SiO<sub>2</sub> ultraviolet curable material with high titanium concentration has been proved to be versatile in advanced nanofabrication." @default.
- W225485807 created "2016-06-24" @default.
- W225485807 creator A5031045924 @default.
- W225485807 date "2015-05-07" @default.
- W225485807 modified "2023-09-23" @default.
- W225485807 title "Nanoimprint lithography using TiO2-SiO2ultraviolet curable materials" @default.
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- W225485807 doi "https://doi.org/10.1117/12.2178347" @default.
- W225485807 hasPublicationYear "2015" @default.
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