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- W2259601903 abstract "We fabricated compounded ZrO2–Al2O3 nanolaminate dielectrics by the atomic layer deposition (ALD) and used them to successfully integrate the high-performance InZnO (IZO) thin-film transistors (TFTs). It is found that nanolaminate dielectrics combine the advantages of constituent dielectrics and produce TFTs with improved performance and stability compared to single-layer gate insulators. The mobility in IZO-TFT was enhanced about 22% by using ZrO2–Al2O3 gate insulators and the stability was also improved. The transfer characteristics of IZO-TFTs at different temperatures were also investigated and temperature stability enhancement was observed for the TFT with ZrO2–Al2O3 nanolaminates as gate insulators. A larger falling rate (∼1.45 eV/V), a lower activation energy (Ea, ∼1.38 eV) and a smaller density-of-states (DOS) were obtained based on the temperature-dependent transfer curves. The results showed that temperature stability enhancement in InZnO thin-film transistors with ZrO2–Al2O3 nanolaminate as gate insulators was attributed to the smaller DOS." @default.
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- W2259601903 date "2016-05-01" @default.
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- W2259601903 title "Performance enhancement in InZnO thin-film transistors with compounded ZrO2–Al2O3 nanolaminate as gate insulators" @default.
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- W2259601903 doi "https://doi.org/10.1016/j.ceramint.2016.02.014" @default.
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