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• W2267671473 startingPage "143" @default.
• W2267671473 abstract "Method of plasma-immersion ion deposition of hydrogenated DLC films on relatively thick flat dielectric substrates from plasma of not-self-sustained low-pressure gas arc discharge is suggested. Coating properties have been investigated experimentally, average energy per a deposited carbon atom depending on discharge current has been calculated. Optimum deposition parameters for obtaining sufficiently hard and transparent high-adhesive a-C:H films on a 4-㎜ thick glass substrates have been determined. Possibility to use these coatings for photo-tools protection from abrasion wear at low operating loads is shown in general." @default.
• W2267671473 created "2016-06-24" @default.
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• W2267671473 date "2002-12-01" @default.
• W2267671473 modified "2023-09-23" @default.
• W2267671473 title "Plasma - immersion Ion Deposition of Hydrogenated Diamond - like Carbon Films on Dielectric Substrates" @default.
• W2267671473 cites W1925295319 @default.
• W2267671473 hasPublicationYear "2002" @default.
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