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• W2267702943 endingPage "R102" @default.
• W2267702943 startingPage "R86" @default.
• W2267702943 abstract "An overview of the deposition and deposition techniques (with the emphasis on PVD techniques) of high-Tc material is presented. The major technologies are discussed and compared, and advantages and problems of various substrate materials are illustrated. The consequences connected with lattice mismatch are discussed, and film nucleation and growth modes of ceramic superconducting material are sketched. Finally, remaining areas for further research are listed." @default.
• W2267702943 created "2016-06-24" @default.
• W2267702943 creator A5091664803 @default.
• W2267702943 date "1999-01-01" @default.
• W2267702943 modified "2023-10-12" @default.
• W2267702943 title "Growth of high-<i><i>T_c</i></i>thin films" @default.
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• W2267702943 doi "https://doi.org/10.1088/0953-2048/12/6/202" @default.
• W2267702943 hasPublicationYear "1999" @default.
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