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• W2279548265 abstract "Chemical vapor deposition (CVD) processes can be used to manufacture materials utilized in the electronics industry and potentially used in industry. In general, the fluid dynamics in CVD processes are described by a system of nonlinear partial differential equations, and the substantial dimensional reduction can be realized using the method of the proper orthogonal decomposition (POD) to represent the system data more efficiently. The approach of implementing the POD method in order to approximate and control transport processes for CVD reactors is demonstrated by considering deposition of a binary compound AB in a two-dimensional and rectangular horizontal reactor. The reactor was assumed operated at a pressure and flow velocity when the following conditions are met: the gas flow is steady, no chemical reaction, heated substrate reactions are very fast, and equilibrium is quickly attained. The transport processes can be classified as a quasi transient flow and be described by a set of governing partial differential equations. In this paper, the mathematical model is firstly introduced. The POD-based reduced-order model is then demonstrated through sequence of steps listed, based on which a system of 1.4801×10 4 differential equations was significantly reduced to a system of only 10 differential equations. POD-based reduced-order solutions are discussed. The applications of POD-based reduced-order model for open loop, feedback control and compensators control of CVD film growth are then discussed." @default.
• W2279548265 created "2016-06-24" @default.
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• W2279548265 date "2016-01-01" @default.
• W2279548265 modified "2023-09-27" @default.
• W2279548265 title "Chemical Vapor Deposition Processes: Reduced-Order Modeling" @default.
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• W2279548265 doi "https://doi.org/10.1016/b978-0-12-803581-8.03615-8" @default.
• W2279548265 hasPublicationYear "2016" @default.
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