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- W2283107185 abstract "SrTiO3 (STO) is the favorite candidate as dielectric material for next generation metal-insulator-metal (MIM) trench capacitors due to its ultrahigh-k value (>200) and its relatively low crystallization temperature (~550 °C) [1]. Atomic layer deposition (ALD) is considered to be the preferred deposition technique among the different available processes due to its layer-by-layer conformal growth and excellent control over thickness and elemental composition of ternary compounds. In this work, thin SrO, TiO2 and STO films were deposited using plasma-assisted ALD from cyclopentadienyl (Cp) based precursors: Ti-Star, [Ti(Cp*)(MeO)3], and Hyper-Sr, Sr(Pr3Cp)2DME [2]. The processes were developed in a commercial Oxford Instruments FlexAL reactor (Fig. 1), which can accommodate wafers up to 200 mm and is equipped with in-situ spectroscopic ellipsometry (SE). A STO ALD super-cycle consisted of a sequence of x SrO cycles and y TiO2 cycles and by tuning the x/y ratio, different STO stoichiometries were deposited. In order to quantify the elemental composition of the films Rutherford backscattering (RBS) measurements were performed. The [Sr]/[Ti] content ratio of the films deposited ranged from 0.7 to 2.1. The thickness and optical properties of the films were extracted from in-situ and ex-situ SE, revealing that the dielectric functions (DF) of SrxTiyOz films change with respect to their [Sr]/[Ti] content ratios (Fig. 2). Taking the RBS values as a reference, it was possible to estimate the film stoichiometry by SE only. The as-deposited films were amorphous but crystallized into the perovskite structure after a postdeposition anneal. The crystallization behavior of the film strongly depended on the stoichiometry of the film. Fig. 3 shows grazing incidence X-ray diffraction (GI-XRD) spectra and corresponding DF of STO films deposited with different [SrO]/[TiO2] ALD cycle ratios after rapid thermal annealing (RTA) them at 600 °C for 5 minutes in N2 atmosphere. Nearly stoichiometric layers had undergone complete crystallization as evidenced by the GI-XRD spectra. Extremely Sr-rich and Ti-rich film remained mainly amorphous. These results were also corroborated by ex-situ SE measurements, in which only fully crystallized films showed a critical point at 4eV in the real part of the DF (e1). This allowed determining the crystalline phase of STO thin films after RTA at different temperatures without recurring to XRD measurements. The research leading to these results has received funding from the European Community's Seventh Framework Programme (FP7/2007-2013) under grant agreement number ENHANCE-238409. Fig. 1 Schematic of the Oxford Instruments FlexAL reactor equipped with in-situ spectroscopic ellipsometer." @default.
- W2283107185 created "2016-06-24" @default.
- W2283107185 date "2011-01-01" @default.
- W2283107185 modified "2023-09-24" @default.
- W2283107185 title "Plasma-Assisted ALD of SrTiO3: Study of Composition and Crystallization Behavior by Spectroscopic Ellipsometry" @default.
- W2283107185 doi "https://doi.org/10.1149/ma2011-02/26/1856" @default.
- W2283107185 hasPublicationYear "2011" @default.
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