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- W2283165369 abstract "One of the broadly used aplications of plasma technologies is thin film deposition on polymer substrates. Thin films can modify surface properties of substrate material. Polysiloxanes are polymers based on silicon and are resistant to heat, UV radiation and oxygen degradation. The key point for reaching coherent coatings with expected properties and their reproducibility in industrial applications is to set up correct deposition parameters e.g. type and configuration of plasma reactor, discharge frequency, power, flow rate of precursor, pressure, temperature of substrate, dimensions and position of substrate in plasma chamber. Polysiloxane layers can be used as scratch resistant, barrier or insulation coatings (also as so called gradient layers) or coatings modyfying hydrophilic properties of original material. This work is focused on finding optimal deposition parameters for creating polysiloxane layer on polystyrene substrate at given conditions (RF capacitively coupled plasma generator)." @default.
- W2283165369 created "2016-06-24" @default.
- W2283165369 creator A5027865064 @default.
- W2283165369 date "2014-01-10" @default.
- W2283165369 modified "2023-09-23" @default.
- W2283165369 title "Depozice polysiloxanových vrstev v nízkoteplotním plazmatu" @default.
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- W2283165369 hasPublicationYear "2014" @default.
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