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- W2284658506 abstract "The multi-step rapid thermal annealing process of Ti/Al/Ni/Au can make good ohmic contacts with both low contact resistance and smooth surface morphology for AlGaN/GaN HEMTs.In this work,the mechanism of the multi-step annealing process is analyzed in detail by specific experimental methods.The experimental results show that annealing temperature and time are very important parameters when optimizing the Ti/Al layer for lower resistance and the Ni/Au layer for smooth surface morphology.It is very important for good ohmic contacts to balance the rate of various reactions by adjusting the annealing temperature and time.We obtained a minimum specific contact resistance of 3.22×1017Ω·cm2 on the un-doped AlGaN/GaN structure with an optimized multistep annealing process." @default.
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- W2284658506 date "2012-01-01" @default.
- W2284658506 modified "2023-09-24" @default.
- W2284658506 title "Analysis of the ohmic contacts of Ti/Al/Ni/Au to AlGaN/GaN HEMTs by the multi-step annealing process" @default.
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