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- W2292615431 abstract "Abstract. We developed a micromachining process for the fabrication of highly sensitive capacitor probes to be used for displacement measurement of an atomic force cantilever. The capacitive structure consists of two adjacent single-crystal silicon beams, one carrying a sharp tip for the force interaction, the other being the counter-electrode. The air gap of 1.5 pm separating the two electrodes is obtained by removal of the oxide in between by selective etching. The capacitance has a typical value of -0.2 pF. Forces acting on the tip induce a bending of the cantilever and change the caDacitance which can be detected bv electronic circuits. 1. Introduction Using capacitive variation to sense physical displace- ments represents an interesting alternative to optical, tunneling or piezoresistive methods. Sensors that use single-crystal silicon as highly elastic material and capacitance change as the readout principle are known to be reliable and accurate [I]. Additionally, thermal silicon dioxide provides good electrical insulation and allows, in combination with highly doped silicon, the" @default.
- W2292615431 created "2016-06-24" @default.
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- W2292615431 date "1992-01-01" @default.
- W2292615431 modified "2023-09-26" @default.
- W2292615431 title "Micromachined atomic force I microprobe with integrated I I capacitive read-out I" @default.
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- W2292615431 hasPublicationYear "1992" @default.
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